ISSN Online: 2377-424X
ISBN Print: 1-56032-797-9
International Heat Transfer Conference 11
HEAT AND MASS TRANSFER IN CONTINUOUS CVD REACTORS
Resumo
Heat and mass transfer of continuous material deposition in a CVD reactor is considered. The main objectives are to investigate the feasibility of a moving susceptor for continuous deposition and to analyze the influence of reactor wall conjugate effects on the deposition rate and uniformity. The numerical model is validated using silicon through extensive comparisons with analytical results and experimental data. Results show that a moving susceptor has a minimal effect on the deposition rate as long as the susceptor velocity is kept small, confirming that continuous deposition is a feasible concept. Conjugate heat transfer shows a significant effect on the deposition rate and uniformity. Through the use of conjugate analysis, reactor material and heating/cooling configurations can be optimized to obtain the desired deposition rate and film uniformity.