Abo Bibliothek: Guest

ISSN Online: 2377-424X

ISBN Print: 978-1-56700-421-2

International Heat Transfer Conference 15
August, 10-15, 2014, Kyoto, Japan

Four-Dimensional Flow Measurements of UV Curable Resin at Thermally-Assisted Nanoimprint Process

Get access (open in a dialog) DOI: 10.1615/IHTC15.mnf.009077
pages 5081-5089

Abstrakt

Ultra violet nanoimprint lithography (UV-NIL) is expected to be next generation nano-scale patterning technique, because of its high resolution and high throughput. UV-NIL uses a mold, which has purpose-designed nano-patterns, a transferred substrate and an UV curable resin. The UV curable resin is placed and pressed between the mold and the substrate. After that, the mold pattern is transferred to a substrate with UV light exposure. The cost of UV-NIL equipment is cheaper than one of the conventional optical lithography system since the UV-NIL equipment has no optical lens system, which is big, complex and very expensive. However, UV-NIL is contact type lithography method, hence, it is very important to prevent the transfer defects to increase productivity. Therefore, a measurements system for UV curable resin flow is desired to investigate three-dimensional resin flow. We have developed four-dimensional flow measurements technique of UV curable resin at nanoimprint process via a micro-digital-holographic particle-tracking velocimetry (micro-DHPTV). In this study, high time-resolution measurements of flow field of UV curable resin at the press process with heating of UV-NIL were carried out using the micro-DHPTV system. The temperature dependence of UV curable resin was evaluated by measuring the UV curable resin while varying its temperature. Moreover, the measurement of UV curable resin on the substrate treated by the mold release agent was also carried out by the micro-DHPTV system. This treatment changes the surface condition of a substrate into hydrophobic surface. We succeeded in measuring the successive change of velocity profiles in a micro-scale thickness of UV curable resin while in nanoimprint press process. As a result, it was found that the velocity profile of UV curable resin near the substrate was changed by increasing the temperature and the treatment affects the velocity profile. We believed that it is possible to improve the UV curable resin flow at thermally-assisted UV-NIL, and served as an essential database.